Lithography with a Pattern of Block Copolymer Microdomains as a Positive or Negative Resist

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 2-11

  Harrison, Christopher ^a   Park, Miri ^a   Chaikin, Paul M ^a   Register, Richard A ^b   Adamson, Douglas H ^b  

^a PRINCETON UNIVERSITY   (United States)

^b Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347246644     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1998-0706.ch001     Document Type: Article

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