Step bunching fabrication constraints in silicon carbide

Semiconductor Science and Technology

Volumn 17, Issue 5, 2002, Pages

  Phelps, G J ^a   Wright, N G ^a   Chester, E G ^a   Johnson, C M ^a   O'Neill, A G ^a  

^a NEWCASTLE UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; FABRICATION; ION IMPLANTATION; LITHOGRAPHY; MORPHOLOGY; SEMICONDUCTOR DOPING; SILICON CARBIDE;

STEP BUNCHING FABRICATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0036571865     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/17/5/102     Document Type: Article

References (18)