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Applied Physics A: Materials Science and Processing

Volumn 74, Issue 5, 2002, Pages 699-702

An effective compliant substrate for low-dislocation relaxed Si1-xGex growth

(5) Luo, Y H a Liu, J L a Jin, G a Wan, J a Wang, K L a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; DISLOCATIONS (CRYSTALS); PHOTOLUMINESCENCE; SILICON COMPOUNDS; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; VISCOSITY; X RAY DIFFRACTION ANALYSIS;

IN SITU ELASTIC DEFORMATION;

SEMICONDUCTOR GROWTH;

EID: 0036568656 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390100930 Document Type: Article

Times cited : (6)

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