Formation of texture controlled aluminum and its migration performance in Al-Si/TiN stacked structure

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1991, Pages 97-101

  Kageyama, Makiko ^a   Hashimoto, Keiichi ^a   Onoda, Hiroshi ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM AND ALLOYS--TEXTURES; METALLIC FILMS; METALLIZING--RELIABILITY;

ELECTROMIGRATION;

INTEGRATED CIRCUITS, VLSI;

EID: 0026142234     PISSN: 00999512     EISSN: None     Source Type: None    
DOI: 10.1109/irps.1991.363217     Document Type: Conference Paper

References (6)