The crossover of preferred orientation in TiN film growth: A real time x-ray scattering study

Journal of Materials Research

Volumn 12, Issue 1, 1997, Pages 9-12

  Je, J H ^a,b   Noh, D Y ^a,b   Kim, H K ^c   Liang, K S ^a  

^a EXXONMOBIL UPSTREAM RESEARCH COMPANY   (United States)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c Pusan Chatolic University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; FILM GROWTH; GRAIN GROWTH; NUCLEATION; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ORIENTATIONAL CROSSOVER; RADIO FREQUENCY SPUTTERING; REAL TIME X RAY SCATTERING; VAPOR PHASE DEPOSITION;

TITANIUM NITRIDE;

EID: 0030735534     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0003     Document Type: Article

References (9)

1. D. S. Rickerby, A.M. Jones, and B. A. Bellamy, Surf. Coat. Technol. 37, 4375 (1989).
2. U. C. Oh and J. H. Je, J. Appl. Phys. 74, 1692 (1993).
3. U. C. Oh, J. H. Je, and J. Y. Lee, J. Mater. Res. 10, 634 (1995).
4. P. K. Dutta and H. William, J. Phys. D: Appl. Phys. 3, 839 (1970).
5. M. Kobayashi and Y. Doi, Thin Solid Films 111, 259 (1984).
6. J-E. Sundgren. Thin Solid Films 128, 21 (1985).
7. J. I. Jeong, J. H. Hong, J. S. Kang, H. J. Shin, and Y. P. Lee, J. Vac. Sci. Technol. A 9, 2618 (1991).
8. S. Veprek, Thin Solid Films 130, 135 (1985).
9. W. R. Busing and H. A. Levy, Acta. Crystallogr. 22, 457 (1967).