Fracture properties of LPCVD silicon nitride thin films from the load-deflection of long membranes

Sensors and Actuators, A: Physical

Volumn 97-98, Issue , 2002, Pages 520-526

  Yang, Jinling ^a   Paul, Oliver ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Bulge test; Fracture stress; Silicon nitride; Thin film; Weibull model

Indexed keywords

BRITTLE FRACTURE; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ELASTIC MODULI; FINITE ELEMENT METHOD; INTEGRATION; MATHEMATICAL MODELS; MECHANICAL TESTING; MEMBRANES; STIFFNESS; STRESSES; THIN FILMS;

BULGE TEST; FRACTURE PROPERTIES; LOAD DEFLECTION RESPONSE; SILICON NITRIDE THIN FILMS; WEIBULL MODEL;

SILICON NITRIDE;

EID: 0036544047     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(02)00049-3     Document Type: Conference Paper

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