Mechanical properties of thin films from the load deflection of long clamped plates

Journal of Microelectromechanical Systems

Volumn 7, Issue 3, 1998, Pages 320-327

  Ziebart, Volker ^b,d   Paul, Oliver ^a,b,c,e   Münch, Ulrich ^b   Schwizer, Jürg ^b   Baltes, Henry ^a,b  

^a IEEE   (Germany)

^b ETH ZURICH   (Switzerland)

^c UNIVERSITY OF FREIBURG   (Germany)

^d UNIVERSITY OF COLOGNE   (Germany)

^e FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

Load deflection method; Mechanical properties; PECVD silicon nitride; Plate theory; Rectangular membranes; Residual stress; Thin films; Young's modulus

Indexed keywords

APPROXIMATION THEORY; DEFLECTION (STRUCTURES); DYNAMIC LOADS; DYNAMIC RESPONSE; ELASTIC MODULI; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLATES (STRUCTURAL COMPONENTS); RESIDUAL STRESSES; SILICON NITRIDE; TENSILE STRENGTH; THIN FILMS;

LOAD-DEFLECTION METHOD; PLATE THEORY;

MICROELECTROMECHANICAL DEVICES;

EID: 0032164907     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.709651     Document Type: Article

References (40)

1. J. W. Beams, "Mechanical properties of thin films of gold and silver," in Structure and Properties of Thin Films, C. A. Neugebauer, J. B. Newkirk, and D. A. Vermilyea, Eds. New York: Wiley, 1959, pp. 183-192.
2. E. I. Bromley, J. N. Randall, D. C. Flanders, and R. W. Mountain, "A technique for the determination of stress in thin films," J. Vac. Sci. Technol., vol. B1, pp. 1364-1366, 1983.
3. X. Ding, W. H. Ko, Y. Niu, and W. He, "A study on silicon diaphragm buckling," in IEEE Solid-State Sensors and Actuators Workshop, Hilton Head, SC, 1990, pp. 128-131.
4. D. S. Popescu, T. S. J. Lammerink, and M. Elwenspoek, "Buckled membranes for microstructures," in Proc. IEEE Int. Workshop Micro Electro Mechanical Syst., Oiso, Japan, 1994, pp. 188-192.
5. O. Tabata, K. Kawahata, S. Sugiyama, and I. Igarashi, "Mechanical property measurement of thin films using load-deflection of composite rectangular membranes," Sens. Actuators, vol. 20, pp. 135-141, 1989.
6. 4 and polycrystalline silicon thin films using the ion implantation technique," Appl. Phys. Lett., vol. 56, no. 14, pp. 1314-1316, 1990.
7. x, thin films," in Proc. MRS Symp., 1990, vol. 188, pp. 79-84.
8. R. A. Stewart, J. Kim, E. S. Kim, R. M. White, and R. S. Muller, "Young's modulus and residual stress of LPCVD silicon nitride determined from membrane deflection," Sens. Mater., vol. 2, no. 5, pp. 285-298, 1991.
9. D. Maier-Schneider, J. Maibach, and E. Obermeier, "Computer-aided characterization of the elastic properties of thin films," J. Micromech. Microeng., vol. 2, pp. 173-174, 1992.
10. O. Tabata, T. Tsuchiya, and N. Fujitsuka, "Poisson's ratio evaluation of thin film for sensor application," in Tech. Dig. 12th Sensor Symp., 1994, pp. 19-22.
11. D. Maier-Schneider, A. Ersoy, J. Maibach, D. Schneider, and E. Obermeier, "Influence of annealing on elastic properties of LPCVD silicon nitride and LPCVD polysilicon," Sens. Mater., vol. 7, no. 2, pp. 121-129, 1995.
12. D. Maier-Schneider, J. Maibach, and E. Obermeier, "Elastic properties and microstructure of LPCVD polysilicon films," IEEE J. Microelectromech. Syst., vol. 4, pp. 238-241, 1995.
13. D. R. Harding and L. T. Ogbuji, "Temperature-dependence of intrinsic stress and biaxial modulus of plasma-deposited silicon nitride and silicon oxinitride films," in Proc. MRS Symp., 1995, vol. 356, pp. 221-226.
14. H. Baltes, J. G. Korvink, and O. Paul, "Numerical modeling and materials characterization for integrated micro electro mechanical systems," in Simulation of Semiconductor Devices and Processes, vol. 6, H. Ryssel and P. Pichler, Eds. Vienna, Austria: Springer, 1995, pp. 1-9.
15. D. Maier-Schneider, A. Köprülülü, S. B. Holm, and E. Obermeier, "Elastic properties and microstructure of LPCVD polysilicon films," J. Micromech. Microeng., vol. 6, pp. 436-446, 1996.
16. D. Jaeggi, "CMOS thermal converters," Ph.D. dissertation, ETH Zurich, Switzerland, 1996, pp. 82-92.
17. M. K. Small, J. J. Vlassak, and W. D. Nix, "Re-examining the bulge test: Methods for improving accuracy and reliability," in Proc. MRS Symp., 1991, vol. 239, pp. 13-18.
18. M. K. Small, J. J. Vlassak, S. F. Powell, B. J. Daniels, and W. D. Nix, "Accuracy and reliability of bulge test experiments," in Proc. MRS Symp., 1993, vol. 308, pp. 159-164.
19. V. M. Paviot, J. J. Vlassak, and W. D. Nix, "Measurement of mechanical properties of thin metal films by means of bulge testing of micromachined windows," in Proc. MRS Symp., 1995, vol. 356, pp. 579-585.
20. M. G. Allen, M. Mehregany, R. T. Howe, and S. D. Senturia, "Microfabricated structures for the in situ measurement of residual stress, Young's modulus, and ultimate strain of thin films," Appl. Phys. Lett., vol. 51, no. 4, pp. 241-243, 1987.
21. F. Maseeh, M. A. Schmidt, M. G. Allen, and S. D. Senturia, "Calibrated measurements of elastic limit, modulus, and the residual stress of thin films using micromachined suspended membranes," in IEEE Solid-State Sensors and Actuators Workshop, Hilton Head, SC, 1988, pp. 84-87.
22. J. Y. Pan, P. Lin, F. Maseeh, and S. D. Senturia, "Verification of FEM analysis of load-deflection methods for measuring mechanical properties of thin films," in IEEE Solid-State Sensors and Actuators Workshop, Hilton Head, SC, 1990, pp. 70-73.
23. P. Lin and S. D. Senturia, "The in-situ measurement of biaxial modulus and residual stress of multi-layer polymeric thin films," in Proc. MRS Symp., vol. 188, 1990, pp. 41-46.
24. M. Mehregany, M. G. Alien, and S. D. Senturia, "The use of micromachined structures for the measurement of mechanical properties and adhesion of thin films," in IEEE Solid-State Sensors Workshop, 1986, pp. 58-61.
25. R. I. Pratt and G. C. Johnson "Mechanical characterization of thin films using full-field measurement of diaphragm deflection," in Proc. MRS Symp., 1993, vol. 308, pp. 115-120.
26. V. L. Spiering, S. Bouwstra, J. Burger, and M. Elwenspoek, "Membranes fabricated with a deep single corrugation for packaging stress reduction and residual stress relief," in Proc. Workshop Micromachining Europe MME'93, Neuchâtel, Switzerland, pp. 223-227.
27. J. J. Vlassak, "New experimental techniques and analysis methods for the study of the mechanical properties of materials in small volumes," Ph.D. dissertation, Stanford Univ., Standford, CA, Aug. 1994.
28. S. Levy, "Large deflection theory for rectangular plates," in Non-Linear Problems in Mechanics of Continua, Proc. Symp. in Applied Mathematics, 1949, vol. 1, pp. 197-210.
29. S. Timoshenko and S. Woinowsky-Krieger, Theory of Plates and Shells. New York: McGraw-Hill, 1987, sec. 28.
30. _, Theory of Plates and Shells. New York: McGraw-Hill, 1987, sec. 2/3.
31. J. J. Vlassak, "A new bulge test technique for the determination of Young's modulus and Poisson's ratio of thin films." J. Mater. Res., vol. 7, no. 12, pp. 3242-3249, 1992.
32. L. Landau and E. M. Lifshitz, Theory of Elasticity. Oxford, U.K.: Pergamon, 1986, p. 14.
33. C. von Rijn, M. van der Wekken, W. Nijdam, and M. Elwenspoek, "Deflection and maximum load of microfiltration membrane sieves made with silicon micromachininig," IEEE J. Microelectromech. Syst., vol. 6, no. 1, pp. 48-54, 1997.
34. B. Choi and E. G. Lovell, "Improved analysis of microbeams under mechanical and electrostratic loads," J. Micromech. Microeng., vol. 7, pp. 24-29, 1997.
35. S. Timoshenko and J. M. Gere, Theory of Elastic Stability. New York: McGraw-Hill, 1961, ch. 9.
36. J. Söderkvist and U. Lindberg, "Characteristics of quasibuckling," Sens. Mater., vol. 6, no. 5, pp. 293-309, 1994.
37. M. Stadtmueller, "Mechanical stress of CVD-dielectrics," J. Electrochem. Sec., vol. 139 pp. 3669-3674, 1992.
38. T. Wu and R. R. Rosler, "Stress in PSG and nitride films as related to film properties and annealing," Solid State Technol., vol. 35, pp. 65-72, May 1992.
39. U. Münch, D. Jaeggi, K. Schneeberger, A. Schaufelbühl, O. Paul, H. Baltes, and J. Jasper, "Industrial fabrication technology for CMOS infrared sensor arrays," in Dig. Tech. Papers Transducers'97, vol. 1, pp. 205-208.
40. V. Ziebart, O. Paul, U. Münch, and H. Baltes, "A novel method to measure Poisson's ratio of thin films," in Proc. MRS Symp., 1998.