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Volumn 664, Issue , 2001, Pages A331-A336

Films and devices deposited by HWCVD at ultra high deposition rates

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEFECTS; GLASS; PHOTOCURRENTS; RAMAN SPECTROSCOPY; SILICON; SILICON WAFERS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

EID: 0035556792     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-664-a3.3     Document Type: Article
Times cited : (5)

References (25)
  • 1
    • 85010828324 scopus 로고    scopus 로고
    • NREL/SR-520-24723, 15 (1998)
    • Guha, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.