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European Polymer Journal

Volumn 38, Issue 4, 2002, Pages 619-629

The molecular mechanism of novolak-diazonaphthoquinone resists

(9) Reiser, A a Huang, J P a He, X a Yeh, T F a Jha, S a Shih, H Y a Kim, M S a Han, Y K a Yan, K a

a POLYTECHNIC UNIVERSITY (United States)

Author keywords

Diazonaphthoquinone; Novolak; Phenolic strings; Resists; Trefonas effect; Wolff rearrangement

Indexed keywords

DISSOLUTION; HYDROGEN BONDS; INTEGRATED CIRCUITS; PHOTORESISTS; PHOTOSENSITIVITY; RADIATION; RESINS; VARNISH;

MOLECULAR MECHANISM; PHENOLIC STRINGS;

AROMATIC POLYMERS;

EID: 0036532978 PISSN: 00143057 EISSN: None Source Type: Journal
DOI: 10.1016/S0014-3057(01)00230-0 Document Type: Review

Times cited : (49)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.