Evaluation of trifluoroiodomethane as SiO2 etchant for global warming reduction

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 1867-1872

  Fracassi, F ^a   D'Agostino, R ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11644297566     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

References (14)

1. F. Fracassi and J. W. Coburn, J. Appl. Phys. 63, 1758 (1988).
2. D. L. Flamm, in Plasma Etching, an Introduction, edited by D. M. Mannos and D. L. Flamm (Academic, New York, 1989).
3. J. T. Houghton, G. J. Jenkins, and J. J. Ephraums, Climate Change. The IPCC Scientific Assessment, 1991 (Cambridge University Press, Cambridge, 1991).
4. S. Karecki, B. Tao, and L. R. Reif, Proceedings to SEMI-SEMICON Southwest 96, "A Partnership for PFC Emission Reduction," Austin, Texas, October 14, 1996, pp. 100-112.
5. U. S. Environmental Protection Agency, Memorandum of Understanding, March 1996.
6. J. T. Houghton, L. G. Meira Filho, J. Bruce, H. Lee, B. A. Callander, E. Haites, N. Harris, and K. Maskell, Climate Change 1994, Radiative Forcing of Climate Change and An Evaluation of the IPCC IS92 Emission Scenarios (Cambridge University Press, Cambridge, 1995).
7. S. Karecki, L. C. Pruette, and L. R. Reif, Proceedings to MRS Fall Meeting 1996-Symposium.
8. R. H. Bruce, J. Appl. Phys. 52, 7064 (1981).
9. R. d'Agostino, F. Cramarossa, S. De Benedictis, and G. Ferraro, J. Appl. Phys. 52, 1259 (1981).
10. R. d'Agostino, F. Cramarossa, and S. De Benedictis, Plasma Chem. Plasma Process. 2, 213 (1982).
11. J. W. Coburn and M. Chen, J. Appl. Phys. 51, 3134 (1980).
12. R. d'Agostino, F. Cramarossa, S. De Benedictis, and G. Ferraro, J. Appl. Phys. 52, 1259 (1981).
13. R. d'Agostino, F. Cramarossa, S. De Benedictis, and G. Ferraro, Plasma Chem. Plasma Process. 4, 163 (1984) and references therein.
14. R. d'Agostino, F. Cramarossa, F. Fracassi, and F. Illuzzi, in Plasma Deposition, Treatment and Etching of Polymers, edited by R. d'Agostino (Academic, New York, 1990).