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Volumn 237-239, Issue 1-4, 2002, Pages 2116-2120
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Plasma characteristics of a multi-cusp plasma-sputter-type ion source for thin film formation of gallium nitride
a
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Author keywords
A3. Plasma sputtering; B1. Gallium compounds; B1. Nitrides
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Indexed keywords
CARRIER CONCENTRATION;
GALLIUM NITRIDE;
INFRARED RADIATION;
MOLECULAR BEAM EPITAXY;
NITROGEN;
PLASMA APPLICATIONS;
SPUTTER DEPOSITION;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
MULTI-CUSP PLASMA-SPUTTER-TYPE ION SOURCES;
PLASMA SPUTTERING;
ION SOURCES;
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EID: 0036531001
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(01)02273-4 Document Type: Article |
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Times cited : (3)
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References (13)
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