Microwave plasma CVD diamond layers on three-dimensional structured Si for protective coating

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 519-522

  Csorbai, H ^a,b,c   Kovats A ^a   Katai S ^a   Hars G ^a   Ducs C ^d   Kalman E ^b,c   Deak P ^a  

^a BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS   (Hungary)

^b CHEMICAL RESEARCH CENTER   (Hungary)

^c BAY ZOLTÁN NONPROFIT LTD FOR APPLIED RESEARCH   (Hungary)

^d RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Diamond growth and characterisation; Nucleation; Sensors

Indexed keywords

ELECTRIC FIELD EFFECTS; KINETIC ENERGY; MASS SPECTROMETRY; MORPHOLOGY; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; SILICON; SURFACE CHEMISTRY; TEXTURES;

BIAS ENHANCED NUCLEATION (BEN);

DIAMOND FILMS;

DIAMOND COATING; MICROSTRUCTURE; MICROWAVE RADIATION; PLASMA TREATMENT; PROTECTION; SILICON; VAPOR DEPOSITION;

EID: 0036508476     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00027-4     Document Type: Article

References (9)