Fabrication of heteroepitaxial diamond thin films on Ir(001)/MgO(001) substrates using antenna-edge-type microwave plasma-assisted chemical vapor deposition

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 478-481

  Fujisaki, Toyokatsu ^a,b   Tachiki, Minoru ^a,b   Taniyama, Norikazu ^c   Kudo, Minoru ^c   Kawarada, Hiroshi ^a,b,d  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b WASEDA UNIVERSITY   (Japan)

^c Micro Denshi Co Ltd   (Japan)

^d FCT Project/JFCC   (Japan)

Author keywords

Chemical vapor deposition; Diamond; Heteroepitaxy; Iridium

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON DIFFRACTION; IRIDIUM; NUCLEATION; SUBSTRATES;

GROWTH PROCESSES;

DIAMOND FILMS;

VAPOR DEPOSITION;

EID: 0036508431     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00654-9     Document Type: Article

References (9)