Hot-wire plasma assisted chemical vapor deposition: A deposition technique to obtain silicon thin films

Journal of Applied Physics

Volumn 91, Issue 3, 2002, Pages 1644-1649

  Ferreira, I ^a   Fortunato, E ^a   Martins, R ^a   Vilarinho, P ^b  

^a DEPARTAMENTO DE CIÊNCIA DOS MATERIAIS   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TECHNIQUE; FILAMENT TEMPERATURE; HOT-WIRE TECHNIQUES; HYDROGEN DILUTION; HYDROGEN GAS; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; RF PLASMA; RF-POWER; SILICON FILMS; SILICON THIN FILM; STRUCTURE AND ELECTRO-OPTICAL PROPERTIES;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; HYDROGEN; OPTICAL PROPERTIES; THIN FILMS; VAPORS; WIRE;

AMORPHOUS SILICON;

EID: 0036469595     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1427133     Document Type: Article

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