Performances of a-Si:H films produced by hot wire plasma assisted technique

Vacuum

Volumn 52, Issue 1-2, 1999, Pages 203-208

  Martins, R ^a   Ferreira, I ^a   Fernandas, B ^a   Fortunato, E ^a  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ELECTRIC CONDUCTIVITY OF SOLIDS; ENERGY GAP; FILM GROWTH; NANOSTRUCTURED MATERIALS; PHOTOSENSITIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; THERMAL EFFECTS; THIN FILMS;

DARK CONDUCTIVITY; HOT WIRE PLASMA ASSISTED DEPOSITION; OPTICAL GAPS;

SEMICONDUCTING FILMS;

EID: 0032762765     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00221-8     Document Type: Article

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