Nanocrystalline undoped silicon films produce by hot wire plasma assisted technique

Materials Research Society Symposium-Proceedings

Volumn 609, Issue , 2000, Pages A2241-A2246

  Ferreira, Isabel M M ^a   Martins, Rodrigo F P ^a   Cabrita, Ana M F ^a   Fortunato, Elvira M C ^a   Vilarinho, Paula ^b  

^a UNIVERSITY OF LISBON   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTROOPTICAL EFFECTS; MOLECULAR VIBRATIONS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING;

MICROGRAPHS; UNDOPED SILICON FILMS;

SEMICONDUCTING FILMS;

EID: 0034429772     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-609-a22.4     Document Type: Article

References (12)