Role of the deposition conditions on the properties presented by nanocrystallite silicon films produced by hot wire

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 2, 1998, Pages 901-905

  Martins, Rodrigo ^a   Ferreira, Isabel ^a   Fernandes, Francisco ^a   Fortunato, Elvira ^a  

^a Center of Excellence in Microelectronics Optoelectronics and Processes   (Portugal)

Author keywords

Crystallite silicon films; Deposition conditions; Hot wire technique

Indexed keywords

BORON; DEPOSITION; ELECTROOPTICAL EFFECTS; HYDROGEN; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SILICON CARBIDE; THIN FILMS;

HOT WIRE TECHNIQUES;

SEMICONDUCTING FILMS;

EID: 0032064398     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00244-0     Document Type: Article

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