Creation of hydrogen radicals by the hot-wire technique and its application for μc-Si:H

Solar Energy Materials and Solar Cells

Volumn 66, Issue 1-4, 2001, Pages 253-258

  Harada, H ^a   Yoshida, N ^a   Yamamoto, K ^a   Itoh, T ^a   Inagaki, K ^a   Inouchi, H ^a   Yamana, N ^a   Aoki, T ^a   Nonomura, S ^a   Nitta, S ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; HYDROGEN; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; VOLUME FRACTION;

HYDROGEN RADICAL DENSITY; MICROCRYSTALLINE SILICON;

CRYSTALLINE MATERIALS;

EID: 0035254262     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00181-1     Document Type: Article

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