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Volumn 46, Issue 2, 2002, Pages 223-234

Modelling of the hole-initiated impact ionization current in the framework of hydrodynamic equations

Author keywords

Generation rate; Hydrodynamic equations; Impact ionization; pMOS transistor; Substrate current

Indexed keywords

COMPUTER SIMULATION; ELECTRIC POTENTIAL; HYDRODYNAMICS; IMPACT IONIZATION; SEMICONDUCTING SILICON; SUBSTRATES;

EID: 0036466922     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(01)00313-6     Document Type: Article
Times cited : (5)

References (28)
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  • 14
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    • A calibrated model for trapping of implanted dopants at material interface during thermal annealing
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    • Oh, Y.-S.1    Ward, D.E.2
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    • Multi-dimensional discretization scheme for the hydrodynamic model of semiconductor devices
    • (1986) COMPEL , vol.5 , Issue.3 , pp. 149-183
    • Rudan, M.1    Odeh, F.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.