The characteristics of residues and optical change of HT PSM during stepwise wet cleaning and optimization of HT PSM cleaning process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 597-605

  Jeong, Woo‐Gun ^a   Kim, Dae‐Woo ^a   Park, Chang Min ^a   An, Ki‐Won ^a   Lee, Dong‐Heok ^a   Kim, Jin‐Min ^a   Choi, Sang‐Soo ^a   Jeong, Soo‐Hong ^a  

^a PKL Photronics   (South Korea)

Author keywords

DHF; Dilute SC 1; FPM; GAE repair; HT PSM; SEM; SL3UV; SPM; XPS

Indexed keywords

ETCHING; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS ASSISTED ETCHING (GAE);

MASKS;

EID: 0036458743     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.476970     Document Type: Article

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