In-process defect inspection and characterization study for dry etching Chrome-on-Quartz binary masks

Proceedings of SPIE- The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 173-182

  Cai, Weidong ^a   Kamberian, Henry ^a   Mattis, Douglas ^a   Morris, Kraig ^a   Tu, Van ^a  

^a Conexant Systems Inc ^*  (United States)

Author keywords

After develop inspection; After exposure inspection; Blank inspection; Chrome dry etch; Defect; In process inspection; ZEP 7000

Indexed keywords

CRYSTAL DEFECTS; DRY ETCHING; INSPECTION; MICROSCOPIC EXAMINATION;

CRITICAL DIMENSION (CD) CONTROL;

MASKS;

EID: 0035043062     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410692     Document Type: Article

References (5)

1. The use of KLA-Tencor STARlight SL300 for in-process contamination inspection to control reticle defect densities
2. Reticle blank inspection and its role in zero-defect manufacturing
3. Dry etch yield enhancement by use of after-develop inspection
4. Post Develop inspection for the defect control by using Lasertec 9MD83SRII system
5. Development of photomask process with precise CD control, and an approach for DFM (Defect Free Manufacturing) using a cluster tool