Deposition of Er3+:Al2O3 films by closed-field unbalanced magnetron sputtering and photoluminescence characterization of the films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4905, Issue , 2002, Pages 617-622

  Li, Chengren ^a   Song, Changlie ^a   Li, Shufeng ^a   Rao, Wenxong ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Closed field unbalanced magnetron sputtering; Er3+ doped Al2O3 thin films; Photoluminescence characterization; Physical properties

Indexed keywords

ALUMINA; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; DOPING (ADDITIVES); ERBIUM; MAGNETRON SPUTTERING; OPTICAL PUMPING; PHOTOLUMINESCENCE; REFRACTIVE INDEX; SPUTTER DEPOSITION; SURFACE ROUGHNESS;

PUMPING POWER;

THIN FILMS;

EID: 0036454912     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.480976     Document Type: Conference Paper

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