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Volumn 389-393, Issue , 2002, Pages 1191-1194

High-performance UMOSFETs in 4H-SiC

Author keywords

Edge termination; JTE; MOSFETs; Power devices; SiC; Trench; UMOSFET

Indexed keywords

MOSFET DEVICES; TRENCHING; DOPING (ADDITIVES); ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; SEMICONDUCTOR JUNCTIONS; SILICON CARBIDE;

EID: 0036429058     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.389-393.1191     Document Type: Conference Paper
Times cited : (6)

References (9)
  • 1
    • 0031103557 scopus 로고    scopus 로고
    • High- voltage double-implanted MOS power MOSFET’s transistors in 6H-SiC
    • J. Shenoy, M. R. Melloch, and J. A. Cooper Jr., “High- voltage double-implanted MOS power MOSFET’s transistors in 6H-SiC”, IEEE Electron Device Lett., 18, 93 (1997).
    • (1997) IEEE Electron Device Lett , vol.18 , pp. 93
    • Shenoy, J.1    Melloch, M.R.2    Cooper, J.A.3
  • 3
    • 0032302935 scopus 로고    scopus 로고
    • High-voltage accumulation-layer UMOSFET's in 4H-SiC
    • J. Tan, J. A. Cooper Jr, M. R. Melloch. “High-voltage accumulation-layer UMOSFET's in 4H-SiC”. IEEE Electron Device Lett., 19,487 (1998).
    • (1998) IEEE Electron Device Lett , vol.19 , pp. 487
    • Tan, J.1    Cooper, J.A.2    Melloch, M.R.3
  • 7
    • 0002591771 scopus 로고    scopus 로고
    • Junction termination extension (JTE), a new technique for increasing avalanche breakdown voltage and controlling surface electric fields in p- n junctions
    • New York, NY, USA
    • V. A. K. Temple, “Junction termination extension (JTE), a new technique for increasing avalanche breakdown voltage and controlling surface electric fields in p- n junctions”. 1997 IEDM Tech. Dig., pp.423-6. New York, NY, USA.
    • 1997 IEDM Tech. Dig , pp. 423-426
    • Temple, V.A.K.1
  • 9
    • 0033099620 scopus 로고    scopus 로고
    • Time-Dependent-Dielectric-Breakdown Measurements of Thermal Oxides on N-Type 6H-SiC
    • M. M. Maranowski and J. A. Cooper Jr., "Time-Dependent-Dielectric-Breakdown Measurements of Thermal Oxides on N-Type 6H-SiC," IEEE Trans, on Electron Devices, 46, 520 (1999).
    • (1999) IEEE Trans, on Electron Devices , vol.46 , pp. 520
    • Maranowski, M.M.1    Cooper, J.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.