Impact of photo-induced species in O2-containing gases on lithographic patterning at 193-nm wavelength

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 746-764

  Okoroanyanwu, Uzodinma ^a   Kunze, Peter ^b   Al Shamery, Katharina ^b   Romero, Jeremias ^a   Bernard, Joffre ^a  

^a ADVANCED MICRO DEVICES   (United States)

^b UNIVERSITY OF OLDENBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ENERGY TRANSFER; FREE RADICAL REACTIONS; INFRARED SPECTROMETERS; MASS SPECTROMETERS; OZONE; PHOTODEGRADATION; PHOTODISSOCIATION; PHOTONS; PHOTOOXIDATION; PURGING; SCANNING; ULTRAHIGH VACUUM;

PHOTO-INDUCED SPECIES;

PHOTORESISTS;

EID: 0036413455     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474623     Document Type: Article

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