Simple estimation of lens aberration with pinhole aperture on backside of photo mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 25-32

  Nakao, Shuji ^a   Maejima, Shinroku ^a   Yamashita, Shigenori ^a   Miyazaki, Junji ^a   Tokui, Akira ^a   Tsujita, Kouichirou ^a   Arimoto, Ichirou ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Hartmann test structure; Lens aberration; Overlay measurement; Pinhole aperture on backside of photo mask; Relaxation of edge transition

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; OPTICAL INSTRUMENT LENSES; POLYNOMIALS;

LENS ABERRATION; PROJECTION OPTICS;

MASKS;

EID: 0036412667     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474580     Document Type: Article

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