Residual stress determination in PECVD TiN coatings by X-ray diffraction: A parametric study

Thin Solid Films

Volumn 333, Issue 1-2, 1998, Pages 50-59

  Thomsen, N B ^a,b   Horsewell, A ^b   Mogensen, K S ^c,e   Eskildsen, S S ^d   Mathiasen, C ^d   Bottiger J ^c  

^a DANFOSS A S   (Denmark)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^c AARHUS UNIVERSITY   (Denmark)

^d DANISH TECHNOLOGICAL INSTITUTE   (Denmark)

^e DANISH METEOROLOGICAL INSTITUTE   (Denmark)

Author keywords

Plasma enhanced chemical vapour deposition; Process parameters; Residual stress; Texture; Titanium nitride coatings; X ray diffraction

Indexed keywords

CERAMIC COATINGS; LATTICE CONSTANTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; TEXTURES; X RAY DIFFRACTION ANALYSIS;

PROCESS PARAMETERS;

TITANIUM NITRIDE;

EID: 0032203885     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00804-9     Document Type: Article

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