Radical behavior in inductively coupled fluorocarbon plasma for SiO2 etching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4845-4848

  Hayashi, Shigenori ^a   Nakagawa, Hideo ^b   Yamanaka, Michinari ^a   Kubota, Masafumi ^a  

^a PANASONIC CORPORATION   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Fluorocarbon radicals; Inductively coupled plasma; Laser induced fluorescence; Multispiral coil

Indexed keywords

DISSOCIATION; FLUORESCENCE; FLUOROCARBONS; FREE RADICALS; LASER BEAM EFFECTS; LIGHT EXTINCTION; REACTION KINETICS; SILICA;

INDUCTIVELY COUPLED PLASMAS (ICP); LASER INDUCED FLUORESCENCE (LIF); MULTISPIRAL COILS (MSC);

PLASMA ETCHING;

EID: 0031176897     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4845     Document Type: Article

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