Effects of photoassisted O2 annealing on the properties of (Ba,Sr)TiO3 thin films

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 1, 2002, Pages 107-111

  Chang, S J ^a   Lee, J S ^a   Wei, M C ^a   Chen, J F ^a   Liu, C H ^b   Liaw, U H ^c  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NAN JEON INSTITUTE OF TECHNOLOGY   (Taiwan)

^c CHIN MIN INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BARIUM COMPOUNDS; CURRENT DENSITY; FILM GROWTH; LEAKAGE CURRENTS; LIGHT SOURCES; MAGNETRON SPUTTERING; OXYGEN; PERMITTIVITY; SILICON; ULTRAVIOLET LAMPS; ULTRAVIOLET RADIATION;

BARIUM STRONTIUM TITANATE OXIDE; LEAKAGE CURRENT DENSITY; PHOTOASSISTED OXYGEN ANNEALING; POST DEPOSITION ANNEALING; VACUUM ULTRAVIOLET LIGHT;

THIN FILMS;

EID: 0036162778     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1424274     Document Type: Article

References (14)