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Volumn 91, Issue 1, 2002, Pages 469-475

Model for doping-induced contrast in photoelectron emission microscopy

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAP REDUCTION; BANDBENDING; DONOR STATE; DOPING DENSITIES; ENERGY DISTRIBUTIONS; INCIDENT PHOTON ENERGY; LOWER LIMITS; P-TYPE DOPING; PHOTOELECTRON EMISSION MICROSCOPY; PHOTON ENERGY; SI DEVICES; SI(0 0 1); STATE DISTRIBUTIONS; SURFACE STATE DENSITY;

EID: 0036137256     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1423399     Document Type: Article
Times cited : (22)

References (20)
  • 13
    • 33845403191 scopus 로고    scopus 로고
    • distributed by Implant Sciences Corporation. Calculates one-dimensional implant profiles with pre- and postannealing simulations
    • Computer code PROFILE version 3.20, distributed by Implant Sciences Corporation. Calculates one-dimensional implant profiles with pre- and postannealing simulations.
    • Computer Code PROFILE Version 3.20


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.