Use of EEPROM-based sensors in investigating physical mechanisms responsible for charging damage

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 2002, Pages 346-353

  Lukaszek, Wes ^a  

^a Wafer Charging Monitors Inc   (United States)

Author keywords

Charging damage; Charging monitors; CHARM 2; Ion implantation; Plasma

Indexed keywords

CURRENT DENSITY; ELECTRIC CHARGE; ELECTRIC INSULATORS; INTEGRATED CIRCUIT MANUFACTURE; ION IMPLANTATION; PLASMAS; SILICON WAFERS;

CHARGING MONITORS;

POTENTIOMETRIC SENSORS;

EID: 0036087162     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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