Plasma vacuum ultraviolet emission in a high density etcher

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1999, Pages 192-195

  Cismaru, C ^a   Shohet, J L ^a   McVittie, J P ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; ELECTRIC CONDUCTIVITY MEASUREMENT; ETCHING; IRRADIATION; MONOCHROMATORS; MOS DEVICES; PHOTONS; PLASMA APPLICATIONS; RADIATION DAMAGE; SILICA; ULTRAVIOLET RADIATION;

HIGH DENSITY ETCHER; OXIDE DAMAGE; PLASMA PROCESSING;

LIGHT EMISSION;

EID: 0033350739     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (11)