Extended 0.13 μm CMOS technology for the ultra high-speed and MS/RF application segments

IEEE Symposium on VLSI Circuits, Digest of Technical Papers

Volumn , Issue , 2002, Pages 68-69

  Chang, C S ^a   Chao, C P ^a   Leung, Y K ^a   Lin, C H ^a   Hsu, H M ^a   Wang, Y P ^a   Chang, S Y ^a   Chiu, T H ^a   Shyu, J S ^a   Wu, C C ^a   Wang, C H ^a   Chang, R Y ^a   Chen, C W ^a   Huang, C F ^a   Chen, C H ^a   Chen, S H ^a   Yeh, T H ^a   Cheng, J Y ^a   Liaw, J J ^a   Chu, Y L ^a   Ong, T C ^a   Yu, M C ^a   Yu, C H ^a   Lin, H J ^a   Tao, H J ^a   Liang, M S ^a   See, Y C ^a   Diaz, C H ^a   Sun, Y C ^a   more..

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC INDUCTORS; INDUCTANCE; INTERFACES (COMPUTER); MIM DEVICES; MOS DEVICES; STATIC RANDOM ACCESS STORAGE;

METAL INSULATOR METAL (MIM) CAPACITORS;

CMOS INTEGRATED CIRCUITS;

EID: 0036045246     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)