Structural characterization of deep sub-micron lithographic structures using small-angle neutron scattering

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 541-548

  Lin, Eric K ^a   Jones, Ronald L ^a   Wu, Wen Li ^a   Barker, John G ^a   Bolton, Patrick J ^b   Barclay, George G ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; CRYSTALS; DIFFRACTION; NEUTRON BEAMS; NEUTRON SCATTERING; SEMICONDUCTOR DEVICE STRUCTURES;

CRITICAL DIMENSIONS;

PHOTORESISTS;

EID: 0036035910     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473493     Document Type: Article

References (17)

1. H. Marchman, in Characterization and Metrology for ULSI Technology, edited by D.G. Seiler, A.C. Diebold, W.M. Bullis, T.J. Shaffner, R. McDonald, and E.J. Walters (American Institute of Physics, College Park, MD, 1998), p. 491.
2. G.W. Reynolds and J.W. Taylor, J. Vac. Sci. Technol. B, 17, 2723 (1999).
3. M.T. Postek, A.E. Vladar, S.N. Jones, and W.J. Keery, Proc. SPIE, 1926, 268 (1993).
4. Y. Martin and K. Wickramasinghe, Appl. Phys. Lett., 64, 2498 (1994).
5. C. Nelson, S. Plamateer, and T. Lyszczarz, Proc. SPIE, 3332, 19 (1998).
6. G.W. Reynolds and J.W. Taylor, J. Vac. Sci. Technol. B, 17, 334 (1999).
7. C.J. Raymond, M.R. Murnane, S. Sohail H. Naqvi, and J.R. McNeil, J. Vac. Sci. Technol. B, 13, 1484 (1995).
8. S.A. Coulombe and J.R. McNeil, J. Opt. Soc. Am. A, 16, 2904 (1999).
9. I. Kallioniemi, J. Saarinen, and E. Oja, Appl. Opt., 38, 5920 (1999).
10. H.T. Huang, W. Kong, and F.L. Terry, App. Phys. Lett., 78, 3983 (2001).
11. T.K. Gaylord and M.G. Moharram, Proc. IEEE, 73, 894 (1985).
12. W.L. Wu, E.K. Lin, Q.H. Lin, and M. Angelopoulos, J. Appl. Phys., 88, 7298 (2000).
13. E.K. Lin, W.L. Wu, Q.H. Lin, and M. Angelopoulos, Proc. SPIE, 4344, 414 (2001).
14. S.M. Choi, J.G. Barker, C.G. Glinka, Y.T. Cheng, and P.L. Gammel, J. Appl. Crystallogr., 33, 793 (2000).
15. M. Agamalian, G.D. Wignall, and R. Triolo, J. Appl. Cryst., 30, 345 (1997).
16. A.R. Drews, J.G. Barker, C.J. Glinka, and M. Agamalian, Physica B, 241-243, 189 (1998).
17. All data in the manuscript and in the figures are presented along with the standard uncertainty (±) of the measurement.