The resist vector: Connecting the aerial image to reality

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 366-380

  Hansen, Steven G ^a  

^a ASML US Inc   (United States)

Author keywords

Dense:isolated bias; Exposure latitude; Isofocal; Lithography simulation; MEEF; Optical lithography; Photoresist; Resist vector

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; IMAGE SENSORS; MASKS; SILICON WAFERS; VECTORS;

AERIAL IMAGES; RESIST VECTORS;

PHOTORESISTS;

EID: 0036030915     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474236     Document Type: Conference Paper

References (23)

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2. Product of Sigma-C.
3. Product of ASML-Masktools.
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