Minimizing optical proximity effect at subhalf-micron resolution by the variation of stepper lens operating conditions at i-line, 248-nm, and 193-nm wavelengths

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 64-75

  Arthur, Graham G ^a   Martin, Brian ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL PROXIMITY EFFECT; SUBMICRON METROLOGY; WAFER STEPPERS;

COMPUTER SIMULATION; DESIGN; IMAGING TECHNIQUES; NUMERICAL ANALYSIS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0029768154     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)