Simple method for characterizing photoresist dissolution properties

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4404, Issue , 2001, Pages 80-88

  Hansen, S G ^a   Van Dommelen, Y ^a  

^a ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; DISSOLUTION; MICROELECTRONIC PROCESSING; THICKNESS MEASUREMENT;

VIDEO DISSOLUTION RATE MONITORS (VDRM);

PHOTORESISTS;

EID: 0034846145     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425194     Document Type: Conference Paper

References (15)

1. The Perkin-Elmer development rate monitor (DRM)