UV thermoresists: Sub 100 nm imaging without proximity effects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 786-793

  Gelbart, Dan ^a   Karasyuk, Valentin ^a  

^a Creo Inc   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; FOCUSING; MASKS; OPTICAL INSTRUMENT LENSES; OPTICAL RESOLVING POWER; ULTRAVIOLET RADIATION;

APODIZING FUNCTIONS; PROXIMITY EFFECTS; THERMORESISTS;

PHOTOLITHOGRAPHY;

EID: 0032663132     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351148     Document Type: Conference Paper

References (12)