Development of advanced ArF resist using alicyclic methacrylate copolymer: The optimum quenchers for this copolymer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (II), Issue , 2000, Pages 1088-1099

  Wakisaka, Yukiya ^a   Fujiwara, Tadayuki ^a   Tooyama, Masayuki ^a   Kuwano, Hideaki ^a   Nishida, Kozi ^a  

^a MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALINITY; COPOLYMERS; POLYMETHYL METHACRYLATES; QUENCHING;

AMPHIPHILICITY;

PHOTORESISTS;

EID: 0033692324     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388272     Document Type: Conference Paper

References (9)