Contact hole patterning performance of ArF resist for 0.10um Technology node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 577-585

  Kim, Jin Soo ^a   Jung, Jae Chang ^a   Kong, Keun Kyu ^a   Lee, Geunsu ^a   Lee, Sung Koo ^a   Hwang, Young Sun ^a   Shin, Ki Soo ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

193 nm lithography; ArF resist; Contact holes; Resist Flow Process

Indexed keywords

HEAT RESISTANCE; INTEGRATED CIRCUIT MANUFACTURE; SEMICONDUCTOR DEVICE MANUFACTURE;

RESIST FLOW PROCESS (RFP);

PHOTORESISTS;

EID: 0036029650     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474258     Document Type: Conference Paper

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