ArF resist for contact hole application

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 791-797

  Rex Chen, K ^a   Lawson, Peggy ^a   Hughes, Tim ^a   Brunsvold, Bill ^a   Rao Varanasi, P ^a   Keller, Robin ^a   Jordhamo, George ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

193nm; Addition cyclic olefin; ArF; Bottlenecking; Contact hole; Lipping; Resist; Swelling

Indexed keywords

MASKS; OLEFINS; SURFACE ACTIVE AGENTS; SURFACE TREATMENT; WETTING;

LIPPING;

PHOTORESISTS;

EID: 0034768523     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436910     Document Type: Article

References (7)