Novel routes toward sub-70nm contact windows by using new KrF photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 232-240

  Kim, Jin Soo ^a   Koh, Cha Won ^a   Lee, Geunsu ^a   Jung, Jae Chang ^a   Shin, Ki Soo ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Contact holes; Hotplate; KrF lithography; Photoresist; Resist Flow Process; Shrink bias

Indexed keywords

CROSSLINKING; DEFORMATION; FLOW MEASUREMENT; SHRINKAGE; THERMAL EFFECTS;

RESIST FLOW PROCESSES (RFP);

PHOTORESISTS;

EID: 0034757317     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436852     Document Type: Article

References (8)