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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 5, 2002, Pages 2047-2051

Phase transformation of thin sputter-deposited tungsten films at room temperature

(3) Rossnagel, S M a Noyan, I C a Cabral, C a

a IBM RESEARCH (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ELECTRIC CONDUCTIVITY; ELECTRON SCATTERING; ELECTROPLATING; OPTICAL INTERCONNECTS; PHASE TRANSITIONS; PHYSICAL VAPOR DEPOSITION; SEMICONDUCTOR DEVICES; SPUTTER DEPOSITION; SURFACES; TEMPERATURE; TUNGSTEN;

BETA TO ALPHA TRANSITION; DIFFUSION BARRIERS; ELECTRON SURFACE SCATTERING; KISSINGER METHOD; SEMICONDUCTOR INTERCONNECT STRUCTURES; THIN SPUTTER TUNGSTEN FILMS;

METALLIC FILMS;

EID: 0036026385 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1506905 Document Type: Article

Times cited : (154)

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