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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 3, 2001, Pages 798-804

Characterization and modeling of electrical resistivity of sputtered tungsten films

(3) Ligot, J a Benayoun, S a Hantzpergue, J J a

a Arts et Metiers ParisTech (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CRYSTALLOGRAPHY; ELECTRIC CONDUCTIVITY; GRAIN BOUNDARIES; PHONONS; POLYIMIDES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON WAFERS; SPUTTER DEPOSITION; SUBSTRATES; TUNGSTEN; X RAY DIFFRACTION ANALYSIS;

SPUTTERED TUNGSTEN FILMS;

METALLIC FILMS;

EID: 0035333511 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1355759 Document Type: Article

Times cited : (16)

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