Characterization of Ti-based nanocrystalline ternary nitride films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 5, 2002, Pages 1967-1973

  Aouadi, S M ^a   Chladek, J A ^b   Namavar, F ^c   Finnegan, N ^d   Rohde, S L ^b  

^a SOUTHERN ILLINOIS UNIVERSITY   (United States)

^b UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^c SPIRE CORPORATION   (United States)

^d University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATINGS; ELLIPSOMETRY; ION BEAM ASSISTED DEPOSITION; LOW TEMPERATURE OPERATIONS; MECHANICAL PROPERTIES; NITRIDES; PHASE COMPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOHARDNESS TESTING; NANOINDENTATION; OPTICAL CONSTANTS; SPECTROSCOPIC ELLIPSOMETRY;

NANOSTRUCTURED MATERIALS;

EID: 0036026361     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1503790     Document Type: Article

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