In situ ellipsometric diagnostics of multilayer thin film deposition during sputtering

Thin Solid Films

Volumn 313-314, Issue , 1998, Pages 511-515

  Gao, Xiang ^a   Glenn, Darin W ^a   Woollam, John A ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

In situ; Multilayers; Spectroscopic ellipsometry; Sputter

Indexed keywords

DIELECTRIC FILMS; ELLIPSOMETRY; FILM GROWTH; METALLIC FILMS; MULTILAYERS; OXIDATION; REACTION KINETICS; SILICON CARBIDE; SPECTROSCOPIC ANALYSIS; SPUTTER DEPOSITION; TERBIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

SPECTROSCOPIC ELLIPSOMETRY (SE);

ULTRATHIN FILMS;

EID: 0032002139     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00875-4     Document Type: Article

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