Influence of gas ratio on the microstructure of RuOx films prepared by using liquid delivery MOCVD

Journal of the Korean Physical Society

Volumn 41, Issue 3, 2002, Pages 354-358

  Kim, Kyoungwon ^a   Kim, Namsoo ^a   Choi, Jungbum ^a   Choi, Ilsang ^b   Kim, Hojoung ^b   Park, Juchul ^b  

^a Chungbuk National University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

Auger electron spectroscopy; Electrode materials; MOCVD; RuOx; Thin film

Indexed keywords

EID: 0036025962     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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