Preparation of SrBi2Ta2O9 thin films by liquid-delivery metalorganic chemical vapor deposition using a double alcoholate source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 11, 1999, Pages 6456-6461

  Jimbo, Takehito ^a   Sano, Haruyuki ^a   Takahashi, Yuji ^a   Funakubo, Hiroshi ^a   Tokumitsu, Eisuke ^a   Ishiwara, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COERCIVE FORCE; CURRENT DENSITY; FERROELECTRIC MATERIALS; FERROELECTRICITY; LEAKAGE CURRENTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; POLARIZATION; REMANENCE; STOICHIOMETRY; STRONTIUM COMPOUNDS; THIN FILMS;

LIQUID-DELIVERY METALLORGANIC CHEMICAL VAPOR DEPOSITION; STRONTIUM BISMUTH TANTALATE;

DIELECTRIC FILMS;

EID: 0033344575     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6456     Document Type: Article

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