Physical disorder and optical properties in the vacuum ultraviolet region of amorphous SiO2

Physical Review Letters

Volumn 87, Issue 17, 2001, Pages

  Hosono, Hideo ^a   Ikuta, Yoshiaki ^a   Kinoshita, Takeru ^b   Kajihara, Kouichi ^a   Hirano, Masahiro ^a  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; AMORPHOUS SILICON; ANNEALING; AROMATIC COMPOUNDS; BAND STRUCTURE; CHEMICAL BONDS; FOURIER TRANSFORMS; LASER APPLICATIONS; LIGHT ABSORPTION; OPTICAL FIBERS; PARAMAGNETIC RESONANCE; PHOTOLITHOGRAPHY; PHOTONS; POINT DEFECTS; ULTRAVIOLET RADIATION;

PHYSICAL DISORDERS; VACUUM ULTRAVIOLET (VUV) RADIATIONS;

FUSED SILICA;

EID: 0035934795     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.87.175501     Document Type: Article

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