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Volumn 181, Issue 3-4, 2001, Pages 331-338

The effect of postdeposition annealing on chemical bonding in amorphous carbon nitride films prepared by dc magnetron sputtering

(3) Jiang, Liudi a Fitzgerald, A G a Rose, M J a

a UNIVERSITY OF DUNDEE (United Kingdom)

Author keywords

Carbon nitride; Thermal annealing; XPS

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CARBON NITRIDE; CHEMICAL BONDS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MORPHOLOGY; TEXTURES; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON NITRIDE FILMS;

AMORPHOUS FILMS;

EID: 0035928977 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(01)00427-5 Document Type: Article

Times cited : (13)

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