Effects of thermal treatment on porous amorphous fluoropolymer film with a low dielectric constant

Materials Science and Engineering: B

Volumn 83, Issue 1-3, 2001, Pages 130-136

  Ding, Shi Jin ^a   Wang, Peng Fei ^a   Wan, Xin Gong ^a   Zhang, David Wei ^a   Wang, Ji Tao ^a   Lee, Wei William ^b  

^a FUDAN UNIVERSITY   (China)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Amorphous fluoropolymer (AF); Low dielectric constant; Porous polymer; Thermal treatment; X ray photoelectron spectroscopy (XPS)

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CAPACITANCE MEASUREMENT; CURRENT VOLTAGE CHARACTERISTICS; DECOMPOSITION; ELECTRIC BREAKDOWN OF SOLIDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERMITTIVITY; POLYTETRAFLUOROETHYLENES; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY; SPIN COATING; THERMAL EFFECTS; THERMODYNAMIC STABILITY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FLUOROPOLYMERS;

PLASTIC FILMS;

EID: 0035927971     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00504-9     Document Type: Article

References (18)